Preferential resputtering phenomenon on the surface of (100)-oriented Ni-Pt films: Effect of substrate bias during sputter deposition

Hashimoto MITURU

doi:10.1116/1.1407243

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Preferential resputtering phenomenon on the surface of (100)-oriented Ni-Pt films: Effect of substrate bias during sputter deposition

ジャーナル論文 - rm_published_papers: Scientific Journal

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Preferential resputtering phenomenon on the surface of (100)-oriented Ni-Pt films: Effect of substrate bias during sputter deposition

Hashimoto MITURU

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol.19(6), ページ2979-2981

11/2001

DOI: https://doi.org/10.1116/1.1407243

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詳細

タイトル: Preferential resputtering phenomenon on the surface of (100)-oriented Ni-Pt films: Effect of substrate bias during sputter deposition
作成者 – 役職なし: Hashimoto MITURU
出版物に関する詳細: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, Vol.19(6), ページ2979-2981
ID: 991002546603607421
組織: The University of Electro-Communications
言語: 英語
資料タイプ: ジャーナル論文
リソースのサブタイプ: rm_published_papers: Scientific Journal